AppNeta to Exhibit at AWS re:Invent
Company to showcase its recently announced support for Node.js Applications
November 3, 2014
BOSTON — November 3, 2014 — AppNeta, the leader in performance and availability insight for business critical web applications with over 3,000 customers worldwide, today announced it will be exhibiting at AWS re:Invent, the largest gathering of the global Amazon Web Services community, taking place November 11 – 14, 2014 in Las Vegas, NV. AppNeta will be in Booth # 133, showcasing its performance monitoring support for Node.js applications.
AWS re:Invent attendees can obtain information and see demonstrations on the recently announced TraceView for Node.js applications, which provides developers with insight into the performance and scalability of all Node.js applications. TraceView is a product in the AppNeta full stack application performance management (APM) solution suite that combines application tracing and data visualization for building faster, more reliable web applications.
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- Paul Davenport