AppNeta to Exhibit at AWS re:Invent

Company to showcase its recently announced support for Node.js Applications


BOSTON — November 3, 2014

BOSTON — November 3, 2014 — AppNeta, the leader in performance and availability insight for business critical web applications with over 3,000 customers worldwide, today announced it will be exhibiting at AWS re:Invent, the largest gathering of the global Amazon Web Services community, taking place November 11 – 14, 2014 in Las Vegas, NV. AppNeta will be in Booth # 133, showcasing its performance monitoring support for Node.js applications.

AWS re:Invent attendees can obtain information and see demonstrations on the recently announced TraceView for Node.js applications, which provides developers with insight into the performance and scalability of all Node.js applications. TraceView is a product in the AppNeta full stack application performance management (APM) solution suite that combines application tracing and data visualization for building faster, more reliable web applications.

For more information on AWS re:Invent, visit

About AppNeta

AppNeta is the Full Stack Application Performance Management (APM) technology leader, providing integrated performance visibility that spans the application code, through the network, to the end user. AppNeta's SaaS solutions give Development, Application and IT Operations teams broad, detailed performance data to see across their web, mobile and cloud-delivered application environments and pinpoint tough performance bottlenecks. With AppNeta, customers have all of the performance data they need to assure ongoing and exceptional delivery of business critical applications and end-user experience. For more information or to get started today, visit

Beth Bryant